EE 441 EE441 LAB REPORT 2 (PSU)

EE 441 EE441 LAB REPORT 2 (PSU)



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EE 441 Lab Report 2 Answers -2020 (Penn State University)
Introduction:
The purpose of this lab is to properly align the source and drain regions that we created in the diffusion process, anddefining the gate region of the device by etching away the thermal silicon dioxide in the gate region.










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