EE 441 EE441 LAB REPORT 1 (PSU)

EE 441 EE441 LAB REPORT 1 (PSU)



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EE 441 Lab Report 1 Answers -2020 (Penn State University)
Introduction:

The purpose of this lab is to learn initial wafer characterization, the wafer cleaning process, and the wafer oxidation. Different wafers usually have different size and orientation, we can verify their resistivity by using Four-Point-Probe Method. Then we learned the wafer cleaning process using different chemical solutions as wafer cleaning is crucial through the device fabrication process. Even defects half the size of circuits critical dimension can make it non-operational. Lastly, we learned wafer oxidation, and we used the furnace to oxidize the wafer surface.









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